FT-IR metrology tools for measuring dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional carbon and interstitial oxygen levels in silicon wafers.

High-performance FT-IR metrology tool for automated 300 mm wafer handling

High-performance FT-IR metrology tool for 100 mm to 200 mm wafers

High-performance FT-IR metrology tool for 200 mm SMIF carriers

Completely integrated wafer profiling stage with FT-IR spectrometer & software