Thermo Fisher Scientific, along with the Semiconductor Industry and SEMI have established specific particle sizes to be used when calibrating Scanning Surface Inspection Systems. Working with instrument manufacturers the SURF-CAL™ product line was created to meet SEMI standard guidelines. Available are sizes considered to be critical sizing nodes as defined by the International Technology Roadmap for Semiconductors (ITRS)1.
By depositing SURF-CAL NIST traceable polystyrene latex spheres (PSL) on specially selected wafers, you can perform periodic calibration checks and compare your scanner with scanners at other locations. You can also assess the performance of your SSIS at critical stages in the manufacturing process.
All products are suspended in deionized, filtered water in 50 mL bottles at a concentration of 3 x108particles per mL. Products, PD1100 and smaller are also available at 1010 particles per mL for applications using the aid of a Differential Mobility Analyzer (DMA) or other size exclusionary techniques.
Measurement Methodology:
To assure direct traceability to NIST, the certified diameters of these products were transferred by transmission electron or optical microscopy from NIST standard reference materials2. The uncertainty was calculated per the NIST Technical Note 1297, 1994 Edition "Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results"4. The uncertainty listed is the expanded uncertainty with a coverage factor of two (K=2). The peak diameter was calculated using approximately the ± 2s range of the particle size distribution. The size distribution was calculated as the standard deviation of the whole peak. The Coefficient of Variation is one standard deviation expressed as a percentage of the peak diameter. The FWHM distribution was calculated as the distribution at half of the peak height expressed as a percentage of the peak diameter.
1. "The National Technology Roadmap for Semiconductors", Semiconductor Industry Association (1999)
2. S.D. Duke and E.B. Layendecker, "Internal Standard Method for Size Calibration of Sub-Micron Spherical Particles by Electron Microscopy", Fine Particle Society (1988)
3. SEMI M52 — Guide for Specifying Surface Inspection Systems for Silicon Wafers the 130 nm Technology Generation.
4. Barry N. Taylor and Chris E. Kuyatt, "Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results". NIST Technical Note 1297, 1994 edition, September 1994.