The high performance EX05 ion gun can produce >10uA beam currents for rapidly etching large craters. For regular shaped, flat craters for depth profiles the beam can be focussed into a spot size of >120mm while maintaining 1uA beam current
Product Detail
High performance depth profile etching To produce regular shaped, flat craters for depth profiles in the minimum possible time a carefully designed high performance ion gun is required. The EX05 can produce more than 10uA beam current with approximately 1mm spot size for rapidly etching large craters in applications such as ESCA. Where a smaller crater is required, for example in AES or SIMS, the beam can be focussed into a spot size of 120mm or less while maintaining 1uA beam current. The intense current density makes more expensive and complicated duoplasmatron ion guns virtually obsolete. Wide, flat scan plates located at the end of the twin lens optical column ensure that the scanning of high current beams is linear even over a large area. Careful design of the ion source and differential pumping eliminates neutral content from the ion beam without the need for a Wien filter. This prevents the centre of a crater being etched at a faster rate than the edges. The highly effective differential pumping design makes the EX05 suitable for use on ion pumped systems without seriously compromising vacuum or ion gun performance. Differential pumping of the source allows the analysis chamber pressure to be better than 1 x 10-7 mbar during normal gun operation and cuts down the neutral content in the beam which would otherwise increase the etching of the central part of a field.
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