Designed for 200 mm SMIF carriers or manual loading of 100 mm to 200 mm wafers, the Nicolet™ ECO™ 2000 measures dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional carbon and interstitial oxygen levels in silicon wafers.
Product Detail
Some of the highlights of the ECO 2000 include:
Completely automated wafer handling
Automated wafer centering and alignment using flats or notches
High throughput
Exceptionally stable and reproducible measurement results
Wafer contact using Teflon-coated vacuum holds on the backside only
Capable of measuring epitaxial film thickness from 300 nm to 7,500 nm
Powerful FT-IR software toolkit for custom recipe generation
SECS/GEM communications software
Compliant with SEMI S2 and S8 safety and ergonomic standards
Flexible measurement options from single point measurements to complete wafer mapping options
Transmission and reflectance measurement capability to accommodate the widest range of materials and films
Support of both ASTM and JEIDA standards
Class 2 cleanroom ready
The ECO 2000 maintains the proven low cost of ownership and high reliability of our long-running series of ECO tools. Founded on our base of expertise in FT-IR technology, the ECO 2000 is also at the top of its class in performance. Thermo is committed to offering the most expertise and the best possible tools for FT-IR metrology. The ECO 2000 is another affirmation of this commitment.
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