Based on Thermo's versatile Almega XR dispersive Raman spectrometer, this instrument uses a non-contact, non-destructive analysis technique that provides molecular-level information for a variety of analytical chemistry and material science studies.
The Almega-Si is equipped with a large format microanalysis station for handling silicon wafers and other large-area samples. The tool supports applications in semiconductor manufacturing support facilities, semiconductor R&D laboratories, and related industries.
Shorter wavelength lasers (blue or green) allow more efficient analysis of small particles and defects that are frequently less than one micron in size.
Applications:
• Molecular-based defect and particle analysis
• Dielectrics characterization
• Thin film chemistry
• Process characterization
• Carbon analysis
The Almega-Si includes:
Microscope Wafer Stage
• 200 mm and 300 mm wafer handling capabilities
• Zero backlash, micron level precision
• Movement integrated with video
Defect Review Software
• Confidently navigate to known locations
• Read KLA-Tencor defect file formats
0 Articoli 
