MicroXR Console Platform

The MicroXR platform provides the following advantages:

• Optical collimation delivers 100 times the countrate and 10 times the precision in the 20µm - 100µm thickness range over traditional XRF techniques
  
  
• Solid state detectors provide superior sensitivity for thin (100Å to 500Å) depositions, multi-layer metal stacks, and elemental peak overlap applications such as Ni/Cu
  
  
• Vacuum Conduit^TM technology dramatically improves accuracy and precision for elements between atomic numbers 11 and 20 (such as P, Si, and Al) without requiring sample chamber evacuation
  
  
• ±2µm stage reproducibility positions structures consistently
  
  
• Zoom optics (30x-300x) enable precise X-ray beam targeting

MicroXR console platform provides unparalleled performance in accuracy, precision and reproducibility, including:

• Vibration-free floor standing design
• Ultra precise stage with ±2 µm position reproducibility
• Travel range for full access of 300 mm wafers
• Optimized for 24/7 operation

The MicroXR console platform consists of three model levels:

MicroXR 1000
The MicroXR 1000 model is the economical option for applications where optical collimation is not required for smaller measurements. Depending on the complexity of your application, choose one of several detector configurations to guarantee optimum application performance.

MicroXR 1100
The MicroXR 1100 model is equipped with monocapillary optical collimation. The MicroXR 1100 model precisely measures tin, lead and silver structures as small as 25 µm, and gold and nickel structures as small as 40 µm.

MicroXR 1200
The MicroXR 1200 model delivers ultimate precision by utilizing polycapillary optical collimation to generate a 45 µm beam for the smallest spot size. Electrically cooled solid-state detectors provide superior resolution and sensitivity for:

• Very thin film applications
• High precision requirements
• Complex stacks or alloys with overlapping elemental peaks