MicroXR VXR Microbeam XRF System

  MicroXR VXR Microbeam XRF System



Exclusive Vacuum ConduitTM technology, optical collimation and high resolution detector provide the best microbeam XRF measurment system in a benchtop configuration.
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The MicroXR VXR model also uses a polycapillary optical collimation to generate a 45 µm beam. The VXR model’s patented1 evacuated conduit design delivers dramatic throughput improvement, measuring the sample in air with near vacuum chamber precision. The vacuum conduit design extends the measurable element range down to aluminum.

Choose either an electrically cooled Si(Li) or silicon drift X-ray detector with superior resolution and sensitivity for:

  • Very thin film applications
  • High precision requirements
  • Complex stacks or alloys with overlapping elemental peaks

MicroXR VXR – Patented Vacuum Environment
Thermo's patented Vacuum Conduit technology maintains vacuum conditions on the x-ray beam generation and detection column systems, while leaving the sample in atmosphere. This unique design creates resolution and sensitivity comparable to a fully evacuated sampling chamber, while maintaining quick and easy sample handling capabilities.

MicroXR benchtop platform is a configurable microbeam XRF film thickness and composition measuring tool. This platform includes several X-ray beam and detection options for application flexibility, and provides unparalleled performance in accuracy, precision and reproducibility.

  • Mechanical or optical X-ray beam collimation options
  • Proportional counter, PIN diode, SDD or Si(Li) X-ray detector options
  • Servo driven x-y-z stage with linear encoder option for accurate sample positioning
  • Measurement method in accordance with ASTM B 568/ISO3497

Application Performance
The MicroXR platform employs X-ray fluorescence technology in its electronics and software. Application performance specifications ensure that your microbeam XRF system is designed for your specific application and operational purposes:

  • Algorithms tools using empirical and fundamental parameters, non-standard and standard-corrected
  • Alloy analysis up to a total of 30 elements
  • Thickness and composition on one to five deposition layers and one substrate layer simultaneously, to a total of 30 elements per application
  • Relative mode calibration for measurement on recessed areas (focus independent)\
  • Absorption mode
  • Linear excitation mode
  • Immersion coating mode
  • Density and base correction
  • Electroless Ni thickness and composition analysis (optional)

Measurement Performance
The MicroXR platform is designed for unsurpassed accuracy and versatility, including several features to tailor the instrument to specific measurements:

  • Application and standards library
  • Automated programmable stage measurement
  • Automatic beam alignment
  • Multiplexed graphical and video signal for single screen operation
  • Point-and-shoot sample positioning
  • Computer-generated reticle with beam size indicator
  • Programmable icons with operator interface designer
  • Two- and three-dimensional mapping software
  • Full statistics package
  • Part number management system with optional bar code reader
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SKU : IQLAADGAAZFADKMANS 
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