The ECOTM 3500 features fully automated handling of wafers up to 300 mm. It measures dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional carbon and interstitial oxygen levels in silicon wafers.
Product Detail
Some of the highlights of the tool include:
Fully automated handling of wafers up to 300 mm
The only FT-IR metrology tool to utilize Asyst Technologies' new state-of-the-art EFEM, rated ISO class 1 for particle contamination
Two in-line load ports
Precision edge grip stage provides exceptionally stable and reproducible measurement results with the absolute minimum wafer contamination
Powerful FT-IR software toolkit for custom recipe generation
SECS/GEM/HSMS communications software
Capable of measuring epitaxial film thickness from 300nm to 7,500 nm
Flexible measurement options from single point measurements to complete wafer mapping options
Measures up to 140 wafers per hour
Transmission and reflectance measurement capability to accommodate the widest range of materials and films
Completely integrated controller with optional second control station in rear of tool to accommodate bulkhead FAB architectures
Support of both ASTM and JEIDA standards
The ECO 3500 improves upon the proven, low cost of ownership and high reliability of our long-running series of ECO tools. Founded on our base of expertise in FT-IR technology, the ECO 3500 is also at the top of its class in performance. Thermo is committed to offering the most expertise, worldwide support and the best possible tools for FT-IR metrology. The ECO 3500 is another affirmation of this commitment.
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