Chemical State Imaging

In this example, the SEM produced by the MICROLAB 350, shows a contaminated area on a semiconductor device measuring approximately 1 micron x 2 micron.

Subsequent Auger spectroscopic examination of the contaminated area and comparison with the surrounding area revealed that the contaminant was silicon dioxide.

The MICROLAB 350 can be operated with an energy resolution which is sufficient to distinguish elemental silicon from silicon in the form of its oxide, as can be seen in the spectrum.

This energy difference is sufficient to allow the two forms of silicon to be mapped, as can be seen in the image which shows an overlay of the the Auger maps of the two forms of silicon.