The ESCALAB 250 geometry has been optimised for XPS depth profiling with excellent depth resolution. Low energy ion sputtering and sample rotation further improve the quality of the data. Advanced digital techniques ensure that even the most subtle of changes in the XPS spectrum can be followed accurately as a function of depth.
Depth Profiling A multilayer, semiconductor material (Ti,W alloy/titanium silicide/silicon) was analysed by XPS sputter profiling. Azimuthal rotation was used during sputtering to optimise depth resolution. The profiles were then generated using Thermo VG Scientific's advanced linear least squares fitting software.

All three layers are clearly seen in the profile. The linear least squares fitting software revealed the chemical states of the Si and Ti in each layer of the structure. The software could differentiate the two states of Ti, separated by only 0.2eV.

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