| The main benefit of the Fourier transform infrared (FT-IR) technique for epitaxial layer thickness measurementsis the speed of the measurement. Other benefits are that the FT-IR thickness measurement is non-destructive and reproducible, lends itself to automation and is operator independent.
Raw data from an FT-IR spectrometer generally take the form of an interferogram, which can be described as a summation of cosine waves. The tool configuration used for the measurement of Epi film thickness is reflectance, where an incident beam of light is observed after it has hit the surface of the wafer. |
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