Thermo has joined the SiLKnet Alliance^sm, helping to speed the development of measurement techniques for characterizing SiLK* film and porous SiLK film properties using their FT-IR and Raman analysis tools. Launched in 2001, the SiLKnet Alliance is the first and broadest Low-K collaboration of its kind. Its goal is to develop fab-ready processes and products that support The Dow Chemical Company family of SiLK semiconductor dielectric resins and complementary Ensemble ES spin-on etch stop films. SiLKnet Alliance members work in parallel to develop a variety of compatible SiLK processes, products, and related technology for IDM and foundry customers. Visit www.silknetalliance.com for additional information on the SiLKnet Alliance and current Alliance members.
*Trademark of The Dow Chemical Company
^smService Mark of The Dow Chemical Company

Further information on SiLKnet at:
FT-IR Metrology of Porous SiLKTM Films